EN_812a087b75b3_RTP-200UHEopengraphit.jpg EN_f7512a010471_UNIRTP-200Schublade100erWafer.jpg EN_a05753a11cc5_UNIRTP-200Schublade150erWafer.jpg EN_031d0af4ae36_UNIRTP-200Schublade200erWafer.jpg EN_389ec49141b4_UNIRTP-200Schublade200erTiegel.jpg

NEW: RTP-200



Made in
Germany
easy to
maintain

Configuration

Gas line
Vacuum
Pump
Water Cooling System
Hydrogen option
Thermocouple
Measurement
Safety
Pat Light
Switchbox
Ramp rate
Fixture of cabinet
Hood
Quartz Glass
Graphit
Power

Product code: RTP-200

Product price: on request
Delivery time: on request




RTP-200 / RTP-200-HV
Rapid Thermal Process Vacuum oven with or without high vacuum 

Technical Specification
• For one single wafer up to 200mm (8") diameter
• With integrated gas in- and outlet
• Maximum temperature: 1000 °C
• Ramp up rate: up to 50 K/sec (optional: 100 K/sec)
• Temperature control by thermocouple (K or S)
• No quartz chamber, aluminium chamber
• Dimensions: about 578 mm x 496 mm x 570 mm (W x D x H)
• Weight: about 70 kg


Part holder
• Quartz tray, fix integrated in door
• Quartz holder for single wafer with 200 mm diameter

Heating

• Heated by 2 x 12 infrared lamps (nominal voltage/power of IR heater: 230 V/2 kW)
• Top and bottom heating (selectable)

Vacuum
•  pressure scale 10exp-3 hPa ... 1000 hPa, or 10exp-6 hPa für RTP-200-HV 

Process Control
• SPS process controller with 50 programs and up to 50 steps each 
  (ethernet interface), SIMATIC
• 50 programs each with up to 50 steps can be stored on touch panel
• USB 2.0 interface for storage of process data (in CSV file format)
• Including 7" touch panel for intuitive and comfortable operation

Water cooling
• Water cooling required (inlet pressure: 5 bar, water inlet temperature: 16...20 °C, low water hardness (< 5° dH), 
   free of Cu particles)

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