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RTP-200

NEW: RTP-200 for 200 mm(8") wafer size or M10 182 x 182 mm solarwafer

Made in
Germany
easy to
maintain
Download

Configuration

Gas line
Vacuum
Pump
Water Cooling System
Hydrogen option
Thermocouple
Measurement
Safety
Pat Light
Switchbox
Ramp rate
Fixture of cabinet
Hood
Quartz Glass
Graphit
Power

Product code: RTP-200

Product price: on request
Delivery time: on request




RTP-200
Rapid Thermal Process Vacuum oven with high vacuum 

Technical Specification
• For one single wafer up to 200mm (8") diameter
• With integrated gas in- and outlet
• Maximum temperature: 1000 °C
• Ramp up rate: up to 50 K/sec (optional: 100 K/sec)
• Temperature control by thermocouple
• No quartz chamber, aluminium chamber
• Dimensions: about 578 mm x 496 mm x 570 mm (W x D x H)
• Weight: about 70 kg


Part holder
• Quartz tray, fix integrated in door
• Quartz holder for single wafer with 200 mm diameter

Heating

• Heated by 2 x 12 infrared lamps (nominal voltage/power of IR heater: 230 V/2 kW)
• Top and bottom heating (selectable)


Vacuum

•  pressure scale 10exp-3 hPa or for RTP-200-HV 10exp-6 hPa

 

Process Control
• SPS process controller with 50 programs and up to 50 steps each 
  (ethernet interface), SIMATIC
• 50 programs each with up to 50 steps can be stored on touch panel
• USB 2.0 interface for storage of process data (in CSV file format)
• Including 7" touch panel for intuitive and comfortable operation

Water cooling
• Water cooling required (inlet pressure: 5 bar, water inlet temperature: 16...20 °C, low water hardness (< 5° dH), 
   free of Cu particles)