VPO Series

UniTemp’s VPO systems are available in vacuum or high-vacuum versions. They enable the processing of individual wafers up to 300 mm, substrates up to 300 x 300 mm, or four 156 mm solar cells. The vacuum process furnaces are ideal for 300 mm production lines where energy efficiency, high throughput rates, tight thermal budgets, flexible production, and cost-effectiveness play a key role.

Our VPOs are designed for manufacturing processes in which, for example, a silicon wafer is heated to high temperatures (up to 1200 °C) within a few seconds. This is made possible by our unique infrared lamp arrangement. It also guarantees optimal temperature uniformity and reproducible process parameters. The fast heating rate (40 K/s) and optimal cooling rates enable short process times and keep the thermal budget of the substrates low. The units can be equipped with optional accessories and customized to meet specific requirements.